Fuji Neopan 400 @ ISO 200

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I'm very basic in developing my b&w negatives. When not using Tri-X, I usually shoot either Fuji Neopan 400 or Delta 400, and develop everything in either D-76 (1:1) or Ilfosol S (1:9). I just shot a roll of Neopan and realized that my meter was set for one stop overexposure. Does Neopan have a sufficient exposure range that I should develop as normal, or by how much should I decrease developing time? Alternatively, as this might be a good time to experiment, what other developer might go well with Neopan at ISO 200? Someone suggested Microdol X, which I used to use extensively years ago with Tri-X to get finer grain. Any suggestions? Thanks.


-- Dennis Couvillion (couvilaw@aol.com), March 03, 2002


Don't have the answer to your first question, but I develop T-Max 100 and Neopan 400 in Rodinal 1:100 with results that I really like. Neopan 400 @ 320, Rodinal 20 minutes at 70 degrees, with constant agitation first two minutes and five seconds every minute thereafter.


-- Christian Harkness (chris.harkness@eudoramail.com), March 03, 2002.

Overexposing one stop is no big problem with b&w film. You could process your negs normally and will still get printable results. However, grain increases notably with overexposure. So, for best results, use a fine-grain developer (Perceptol, Microdol) and develop to normal contrast. These developers loose about 2/3 film speed, so you will get almost perfectly exposed negs.


-- Georg Kern (georg.kern@uibk.ac.at), March 04, 2002.

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