Hey folks,

Just read about Diafine in a posting and I'm curious about your experiences with it, pro and con. I'd be using it to process 8 X 10 sheet film so grain isn't a concern but ease and acutance are. Your thoughts, experiences and what you've read/heard would be appreciated, although please indicate which of the above they are. Thanks

-- Sean yates (yatescats@yahoo.com), June 05, 1999

Answers

Sean:

Check the current dialog at http://www.exeter.ac.uk/mfd (the Medium Format Digest) on Diafine.

-- Gene Crumpler (nikonguy@worldnet.att.net), June 14, 1999.

Diafine experiences

I've never used Diafine, (a two-step process from what I remember), but HAVE used Acufine, (made by the same Chicago, Illinois company), and found it to be an excellent product. Would assume that Diafine carries on that same good tradition. Hope this helps. David Huffman

-- H. David Huffman (craptalk@ix.netcom.com), July 07, 1999.

tried diafine many years ago. when it works, it works great. it is panthermic(wide temperature range), but is very sensitive to contamination, ie, make sure tanks and reels are squeeky clean. anyway, i never got consistent results with it, probably my fault. claimed boost in exp. index may be a little optimistic. found acu-one to be a better bet. great, consistent results. jim

-- jim meisenbach (batcat4@bitwisesystems.com), July 18, 1999.

I've used Diafine many times--an excellent developer that produces full tonal range. Do not use this or another divided developer AB55 (from Cachet) for adjusted zones because the two bath formula acts on the silver to the fullest possible extent. I have heard on Medium Format Digest that some have used a shortened development time in solution B for Techpan. David Vestal uses Diafine for his work. I use it because I want full tones and don't like to heat up or cool down chemicals. Diafine and AB55 can develop different film at the same time in the same tank between 60-80 degrees. Diafine will add at least a stop to most film speeds. Development times are listed on the box.

-- Richard Murray (rmurray@nmaa.si.edu), July 28, 1999.